ê–åF‰»Šwˆê”ÊEÞ—¿HŠwE”––ŒE”¼“±‘ÌEH•iE•ï‘•
•½¬@Œ³”N‚RŒŽ@“Œ‹žH‹Æ‘åŠwHŠw•”–³‹@Þ—¿HŠw‰È‘²‹Æ
•½¬@‚R”N‚RŒŽ@“¯‘åŠw‰@—HŠwŒ¤‹†‰È–³‹@Þ—¿HŠwêUC—¹
•½¬@‚R”N‚SŒŽ@êi—Ù”žŽðŠ”Ž®‰ïŽÐ‚ÅŒ¤‹†ŠJ”‚ð’S“–
•½¬@‚X”N‚QŒŽ@‹ZpŽmi‰»Šw•”–åj“o˜^
•½¬‚P‚Q”N‚PŒŽ@•Ù—Žm“o˜^A“Á‹–Ž––±ŠŽQ‰æ
•½¬‚P‚T”N‚PŒŽ@ƒAƒCƒ‹’màŽ––±ŠŠJÝ
•½¬‚P‚V”N‚PŒŽ@“Á’èNŠQ‘iב㗋Ɩ±‚Ì•t‹L“o˜^
MOCVD–@‚É‚æ‚é‹—U“d‘Ì”––Œ‚ÌŒ¤‹†A‚RŽŸŒ³Œ`ó‚̃Kƒ‰ƒX‘Ì‚Ö‚ÌŽ_‰»•¨”––Œ‚Ìö’…‹ZpAŒõ‹@”\«ƒKƒ‰ƒXÞ—¿i‚r‚g‚fC‚o‚g‚aCƒŒ[ƒU[)AƒKƒ‰ƒXŒšÞAŒšÞ—p—nŽËÞA–³‹@—L‹@•¡‡Þ—¿AƒvƒŒƒXƒŒƒ“ƒYAƒKƒ‰ƒX••’…ÞA“™‚ÌŠeŽí•ª–ì‚ÌŒ¤‹†ŠJ”‚ðŒoŒ±BH•i•ï‘•E—eŠíŠÖ˜A‚ÌŠJ”‚ðŒoŒ±B
“ú–{•Ù—Žm‰ï”–¾‘Š’kˆõ‚ð’S“–B
˜_•¶F
1.Preparation of TiO2-ZrO2 Films by MOCVD, iJ. Chem. Soc. Japan)[12]
1395-1401 (1990),
2.Formation of Epitaxial Pb(Zr,Ti)O3 Films by CVD., (J. Ceram. Soc. Japan), 99 [3] 248-250 (1991)
3.Growth of Epitaxial PLZT Films by CVD,(J. Ceram. Soc. Japan), 99 [12]
1169-1171 (1991)
4.Deposition Condition of Epitaxially Grown PZT Films by CVD., iJ. Ceram.
Soc. Japan,j 102 [8] 795-798 (1994)
5.Characterization of Epitaxially Grown
CVD-Pb(Zr,
Ti)O3 Films
with High Deposition Rate., iJ. Ceram. Soc. Japanj, 102 [2] 114-118 (1994)
6.uŠJ”ŽÒ‚©‚猩‚½’m“IŠ—LŒ vA•ï‘•‹ZpA•½¬‚P‚U”N‚SŒŽ†A26-30•Å
|